Researchers are exploring how to achieve incredibly fast optical switching , controlling light with extreme speed , and a new study details a promising mechanism using indium nitride. Junjun Jia (Waseda University) and Minseok Kim and Yuzo Shigesato (Aoyama Gakuin University) et al, have demonstrated broadband ultrafast switching in a thin film of indium nitride, spanning visible to near-infrared light, by utilising transient Pauli blocking. This research is significant because it reveals how this switching can occur simply through heating the material with a laser, rather than needing to inject extra electrons , a simpler and potentially more efficient approach. Their findings, based on pump-probe measurements and a novel theoretical model, provide valuable insights for developing next-generation, ultra-fast photonic devices for communications and beyond.
The developed theoretical framework provides a simplified yet powerful approach to understanding the observed optical behaviour, overcoming limitations of more complex computational methods like time-dependent density functional theory. This model successfully explains how thermalized electrons transiently occupy the conduction band, blocking optical absorption and resulting in a measurable increase in transmittance across a broad spectral range. The research establishes a clear connection between the electronic properties of InN and its ultrafast optical response, offering new insights into the design of advanced photonic devices.
Notably, the study unveils that the observed switching isn’t reliant on collective electron behaviour, as seen in heavily doped materials, but rather stems from the direct impact of Pauli blocking on optical transitions. This finding is significant because it simplifies the theoretical treatment and opens new avenues for tailoring the optical properties of semiconductors. Furthermore, the work opens possibilities for creating ultrafast optical modulators, shutters, and filters for high-speed communication and computing systems. The ability to induce this effect solely through temperature control, without significant carrier injection, is particularly advantageous for device fabrication and operation, promising enhanced stability and performance. These findings represent a substantial advancement in the field of ultrafast optics and materials science, offering a pathway towards realising next-generation photonic technologies.
InN film growth and characterisation are crucial
The research team grew c-oriented InN films on c-sapphire substrates via molecular epitaxial evaporation, fabricating polycrystalline n-type material with an electron concentration of 5.50 ±0.82×1019cm−3 and a Hall mobility of 5.43 ±0.64 cm2/Vs, as determined by a HL, 5500PC Hall measurement system. Film thickness was established at 400nm through Fourier-transform infrared (FTIR) spectroscopy and Drude model fitting, while X-ray diffraction (XRD) confirmed an out-of-plane lattice constant c of 5.700Å, aligning with standard values. To characterise the optical properties, the study extracted the absorption coefficient α from transmittance (T) and reflectance (R) spectra measured using a UV, 3600 plus UV, Vis, NIR spectrometer, employing the equation T = (1 −R) exp(−αd). High-sensitivity ultraviolet photoelectron spectroscopy (HS-UPS) was then performed to define the electronic structure around the valence band maximum, maintaining a base pressure of approximately 10−8 Pa and applying a, 5V bias to the sample.
A monochromatic Xe Iα line with a photon energy of 8.437 eV served as the excitation source, incident at 45◦, and the hemispherical analyzer (MBS A-1) operated in normal emission geometry with a pass energy of 10 eV and a total energy resolution of 75 meV. Femtosecond time-resolved transient transmission experiments employed a pump-probe technique to examine ultrafast carrier dynamics, exciting the InN film at room temperature with 140 fs Ti:Sapphire laser pulses at 1.55 eV with a 76MHz repetition rate. A polarized beam splitter directed the majority of the laser power as the pump, while the remaining power generated a broadband probe laser spanning 400, 1000nm using a FemtoWHITE 800 supercontinuum generation module. Both beams were focused normally onto the sample via a 10× objective lens, achieving a pump beam spot diameter of 10.3μm (1/e2 diameter).
InN exhibits ultrafast switching via Pauli blocking
The research elucidates the underlying physical mechanism through probe-energy-resolved analysis and a theoretical model founded on a quasi-equilibrium Fermi-Dirac distribution, successfully capturing experimental transients. The team measured an electron concentration of 5.50 ±0.82×1019cm−3 and a Hall mobility of 5.43 ±0.64 cm2/Vs within the polycrystalline n-type InN film, determined using a HL, 5500PC Hall measurement system. Furthermore, the film thickness was established at 400nm by fitting the Fourier-transform infrared (FTIR) spectrum using the Drude model, providing precise structural characterisation. Data shows the out-of-plane lattice constant c, calculated from X-ray diffraction (XRD), was found to be 5.700Å, aligning well with the standard powder diffraction value of 5.7033Å at room temperature.
The absorption coefficient α was extracted from optical transmittance and reflectance spectra, utilising the relation T = (1 −R) exp(−αd), where d is the film thickness, and was found to be significant for the observed switching. High-sensitivity ultraviolet photoelectron spectroscopy (HS-UPS) was employed to determine the electronic structure around the top of the valence band, providing crucial insights into the material’s electronic properties. Results demonstrate that for a pumping power of 220mW at 1.55 eV, the photoexcited carrier density (nex) was estimated to be 3.84 × 1016cm−3, calculated considering lateral diffusion and surface recombination. Tests prove the framework not only deepens fundamental understanding of nonequilibrium carrier dynamics but also opens new avenues for semiconductor-based ultrafast optical switches, filters, and modulators leveraging transient Pauli blocking as an active control mechanism. This breakthrough delivers a simplified theoretical framework for understanding ultrafast optical switching and its manifestation as a broad spectral feature in the visible range.
InN’s ultrafast switching via electronic heating promises revolutionary
The authors acknowledge that conventional exponential fitting models can misrepresent electron cooling dynamics due to varying cooling times at different probing levels, a limitation considered in their analysis. Future research could explore the application of these findings in designing all-optical communication systems and quantum information processing devices, potentially leading to faster and more efficient photonic technologies.
👉 More information
🗞 Transient Pauli blocking in a InN film as a mechanism for broadband ultrafast optical switching
🧠 ArXiv: https://arxiv.org/abs/2601.14656
